Invited Talks

 

Invited Speakers

Affiliation

 Country/

Region

Presentation Title

Mika Prunnila

VTT Technical Research Centre

Finland

ALD enhanced on-chip supercapacitors

Miin-Jang Chen

National Taiwan University

China Taiwan

Applications of atomic layer deposition on nanoplasmonics and III-V nitride epitaxy

Jin-Seong Park

Hanyang University

Korea

Atomic layer deposition of oxide semiconductor and conductor for flexible devices

Young-Beom Kim

Hanyang University

Korea

ALD for low-temperature thin film SOFC application

Rong Chen

Huazhong Univ Sci Technol

China

Design and synthesis of core shell nanoparticles with atomic layer deposition 

Xinwei Wang

Peking Univeristy

China

Atomic Layer Deposition of Cobalt, Nickel, and Iron Sulfides

Anil U. Mane

Argonne National Laboratory 

USA

ALD of nanostructure composites and their applications

Hao-chung Kuo

National Chiao Tung University

China Taiwan

Recent Progress of ALD for High Power HEMT and Filp Chip LED

Jeong Hwan Han 

KRICT

Korea

Novel Liquid ALD Precursors for High Mobility Oxide Semiconductor Applications

Il-Kwon Oh

Yonsei University

Korea

The improvement of interface quality by using ALD high-k dielectrics for Ge-based devices

Yong Qin

Institute of Coal Chemistry, CAS

China

Catalytic properties of confined nanocatalysts produced by atomic layer deposition

Anjana Devi

Ruhr-University Bochum

Germany

Influence of ligand structure on the physico-chemical properties of ALD precursors

Chang Liu

Wuhan University

China

ALD growth of m-Plane N-ZnO/AlN/P-Si heterojunction diodes: Structural, electrical and optical properties

Yong Wang

Nanjing Tech University

China

Hydrophobic polymeric foams enabled by atomic layer deposition for Oil/Water  separations

Jinlong Gong

Tianjin University

China

Effective charge carrier utilization through ALD surface engineering for photoelectrochemical water splitting

Toshihide Nabatame

National Institute for Materials Science

Japan

Effect of TMA on resistive switching characteristics in memristors with TiO2/Al2O3 bilayer

Sang Woon Lee

Ajou University

Korea

Creation of two-dimensional electron gas at oxide heterostructures and its application to gas sensors

Hangbing Lv

Institute of Microelectronics, CAS

China

3D resistive switching memory: status and outlook

Genquan Han

Xidian University

China

Negative capacitance Ge and GeSn MOSFETs integrated with HfZrOx deposited by ALD

Liang Li

Soochow Univeristy

China

Applications of atomic layer deposition in energy devices

Juhana Kostamo

Picosun Oy

Finland

Application of protective, biocompatible ALD coatings on polymer-containing components for medical devices

Soo-Hyun Kim

Youngnam University

Korea

Atomic layer deposition of Ru-based binary or ternary thin films for seedless Cu interconnects

Yuqiang Ding

Jiangnan University

China

Copper atomic layer deposition: making a bridge between laboratory and application

Han-Bo-Ram Lee

Incheon National University

Korea

Atomic layer deposition of metals on textiles for wearable electronics

Chao Zhao

Institute of Microelectronics, CAS

China

Investigation on atomic layer deposition of N type work-function metal for 14nm FinFETs and beyond

Yu Duan

Jilin University

China

The realization of thin film encapsulation for organic light emitting diodes by atomic layer deposition

Hao Van Bui

Delft University of Technology

Netherlands

Controlled growth of noble metal nanoclusters on graphene nanoplatelets by scalable atmospheric pressure ALD

Haiyang Xu

Northeast Normal University

China

Metal Oxides based Memristive synapse: Models, Functions and Applications

Jiaming Sun

Nankai Univeristy

China

Efficient electroluminescence from silicon-based rare earth doped nanolaminated gate oxides 

Qiang Chen

Beijing Institute of Graphic Communication

China

Atomic layer deposition: from precursor synthesis, setup building to nanomaterials design and film applications

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