Prof. Hyungjun Kim
School of Electrical and Electronic Engineering
Yonsei University, Korea
Hyungjun Kim is a professor at school of Electrical and Electronic Engineering at Yonsei University, Korea. Also, he is a director for Air Liquide-Yonsei Joint Research Center (ALYC), at Yonsei University. His main research interests include advanced thin film technology focusing on atomic layer deposition (ALD) and nanoscale device fabrication. Before he joined the faculty of Yonsei University in 2009, he was a faculty at the department of materials science and engineering of Pohang University of Science and Technology (Postech), Korea, from 2004 to 2009 and research staff member in the Silicon Technology Department, IBM Research Division (Yorktown Heights, NY) from 2000 to 2004. He pioneered plasma-enhance atomic layer deposition (PE-ALD) of metals and nitrides for Cu interconnect technologies and explored various thin film processes for CMOS and novel nanodevices fabrication. Prior to joining IBM Research in 2000, he was a visiting research professor at the University of Illinois, where he carried out research in the surface chemistry and growth of thin layers of silicon-germanium alloys and metal and nitride thin films.
Dr. Kim is an author of more than 200 technical publications in international journals and filed or awarded more than 50 patents. He has also given invited lectures/presentations at numerous technical conferences and is active in conference organizing. He served as an organizing chair for 2006 ALD topical conference on atomic layer deposition in Seoul, Korea. Also, he served as a director for Applied-Materials Yonsei Emerging Research Center (AYET) from 2009 to 2014. Currently, he is a member of organizing committee for several international conferences including American Vacuum Society, Materials Research Society, and topical conference on atomic layer deposition. He is also an editorial board member for Thin Solid Films and Metals and Materials International.
Dr. Kim received his Ph.D. degree in materials science and engineering from University of Illinois (Urbana-Champaign, 1998), and B.S. and M.S. degrees in the Inorganic Materials Department at Seoul National University (1990 and 1992, respectively). Dr. Kim is a member of the Institute for Electrical and Electronics Engineers and American Vacuum Society.
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