Following the successes of the previous two international Conferences on ALD Applications and China ALD Conferences since 2010, the 3rd International Conference on ALD Applications & 2016 China ALD Conference will be a four-day meeting, dedicated to the fundamentals and applications of Atomic Layer Deposition (ALD) technology in various fields. It will be held in Suzhou, China, from October 16 to 19, 2016. This conference will feature plenary sessions, oral sessions, poster sessions and industrial exhibitions.

The ALD technique has been widely used and explored in numerous fields such as microelectronics, photoelectronics, optical coating, functional nanomaterials, MEMS/NEMS, energy storage, biotechnology, catalysis technology and etc. This is ...                                                                                                                                                     More>>


Full contributed papers will be peer reviewed and published in a special issue Nanoscale Research Letters (2015 impact factor: 2.584)​ . Manuscript submission deadline: December 31, 2016. The details can be found in the right button "More".

Important Dates

    Conference Registration Hours

      Oct. 16th, 2016     13:00 – 18:00    

      Oct. 17-18th, 2016    08:00 – 18:00   

    Conference Schedule

      Oct. 17-18th, 2016    08:20 – 18:00   

      Oct. 19th, 2016   08:00 – 12:00 

    The details can be found in "Program".


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